Nap of a kind of polish installs buy and polishing system

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Application date: 201711401420.

0 application day: 2017.

12.

22 countries / the: that visit town? This discharge  ?11) publishs name: 107953242A publishs day: 2018.

04.

24 advocate classify date: B24B 37/10(2012.

01) classifies date: B24B 37/10(2012.

01); B24B 37/20(2012.

01); B24B 37/32(2012.

01); B24B 53/017(2012.

01) applicant: Beijing semiconductor is special equipment institute (the 45th institute of company of group of Chinese electron science and technology) inventor: Bai Hao of; of Liu Yongjin of; of Xiong Peng of Hu Xingchen; like that procuratorial: : of orgnaization of Zhao Zhiyuan representative?  of this ù of  of fear of  of Shao of condition of ┏  storehouse does ㄆ of  of Xing contraction Ge bilge: of address of applicant of?11371) of Zheng of ê small box? This ┦ is inclined  of this ⑶ of  of sprain of border of ┚  eyebrow summary of date of? of ┖ blame  : This invention provided device of nap of a kind of polish and polishing system, belong to polishing device sphere, device of this polish nap includes: Polishing head and maintain link, be narrated maintain annulus setting to narrate the end end polishing head in place, what narrate the end panel that maintains annulus to be used at contacting abrade mat to set abrasive grain layer; Polishing head in order to places the circle that hold any crystalline substance and side of round to brilliant back uses force, maintain annulus to in order to accommodates brilliant circle and make brilliant circle limitation is inside polishing head, maintain annulus to be able to avoid brilliant circle to slip to go out or be swung to go out from polishing head bottom. Maintain the abrasive grain layer that sets on annulus, keeping polishing head pressure while undertake synchronous nap to polishing mat, make brilliant circle is in a kind of smooth and even polishing environment from beginning to end; This polish system includes to prop up, polishing mat and device of nap of a polish. Dominion benefit asks a kind of polish builds entire plant, its feature depends on, include: Polishing head and maintain link, be narrated maintain annulus setting to narrate the end end polishing head in place, what narrate the end panel that maintains annulus to be used at contacting abrade mat to set abrasive grain layer. CNC Milling